14 Plasmonics and Super-Hydrophobicity
513
were used for high resolution imaging. Multiple measurements were done in different
scan directions to prove the avoidance of artifacts. The images had a resolution of
1024 × 1024 points and were acquired at a scanning rate of 1 Hz. The images
obtained were processed with the WSxM © software, using either flattening or plane
fit according to the relief characteristics, with the minimal polynomial order needed.
Using conventional mathematical procedures implemented in Mathematica , the
roughness and fractal dimension of the samples were derived.
14.3.4 Fluorescence Microscopy Characterization of Rhodamine
deposits.
Fluorescence microscopy measurements were performed using an inverted microscope, with infinity-corrected optics (Nikon-ECLIPSE TE 2000-U). The microscope
objectives used were a Plan Fluor 40x and a Plan Apo 60x, with 0.75 and 0.95 numerical apertures. For probe excitation a violet diode laser source emitting at 408 nm,
an Argon source emitting at 488 nm, Helium Neon laser source emitting at 543 nm
were used. A Nikon D-Eclipse C1 scanning head with three channels was utilized
for the measurements.
14.3.5 Raman Characterization of Rhodamine Deposits
Micro-probed Raman spectra were obtained using Renishaw inVia Raman microscope at room temperature through 20x objective of a Leica microscope. The Raman
spectra were excited by the 514.0 nm line of an Ar + laser in backscattering geometry. The laser power was 0.18 mW with an integration time of 20 s. Mapping Raman
measurements were carried out with the step size 19.50 μm and 34.60 μm in x and
y-axis direction, respectively.
14.4 Results
Several SEM micrographs of the SHSs were taken over different samples to assess
uniformity and reproducibility.
In Fig. 14.5a–b, silicon pillars are arrayed over large square areas sizing up to some
millimeters per side, with few or no defects in the structures which thus recover a
perfect hexagonal lattice. This would verify the fabrication process capability to attain
extreme control over the key characteristics of the micropillars such as shape and size,
at least on a large scale. On a smaller scale, as in Fig. 14.5c–d, the exposed top surface
of the pillars is wrapped by silver nanograin assemblies. The AFM image of Fig. 14.5e
shows the grains randomly distributed with an average grain size of about 50 nm and
513
were used for high resolution imaging. Multiple measurements were done in different
scan directions to prove the avoidance of artifacts. The images had a resolution of
1024 × 1024 points and were acquired at a scanning rate of 1 Hz. The images
obtained were processed with the WSxM © software, using either flattening or plane
fit according to the relief characteristics, with the minimal polynomial order needed.
Using conventional mathematical procedures implemented in Mathematica , the
roughness and fractal dimension of the samples were derived.
14.3.4 Fluorescence Microscopy Characterization of Rhodamine
deposits.
Fluorescence microscopy measurements were performed using an inverted microscope, with infinity-corrected optics (Nikon-ECLIPSE TE 2000-U). The microscope
objectives used were a Plan Fluor 40x and a Plan Apo 60x, with 0.75 and 0.95 numerical apertures. For probe excitation a violet diode laser source emitting at 408 nm,
an Argon source emitting at 488 nm, Helium Neon laser source emitting at 543 nm
were used. A Nikon D-Eclipse C1 scanning head with three channels was utilized
for the measurements.
14.3.5 Raman Characterization of Rhodamine Deposits
Micro-probed Raman spectra were obtained using Renishaw inVia Raman microscope at room temperature through 20x objective of a Leica microscope. The Raman
spectra were excited by the 514.0 nm line of an Ar + laser in backscattering geometry. The laser power was 0.18 mW with an integration time of 20 s. Mapping Raman
measurements were carried out with the step size 19.50 μm and 34.60 μm in x and
y-axis direction, respectively.
14.4 Results
Several SEM micrographs of the SHSs were taken over different samples to assess
uniformity and reproducibility.
In Fig. 14.5a–b, silicon pillars are arrayed over large square areas sizing up to some
millimeters per side, with few or no defects in the structures which thus recover a
perfect hexagonal lattice. This would verify the fabrication process capability to attain
extreme control over the key characteristics of the micropillars such as shape and size,
at least on a large scale. On a smaller scale, as in Fig. 14.5c–d, the exposed top surface
of the pillars is wrapped by silver nanograin assemblies. The AFM image of Fig. 14.5e
shows the grains randomly distributed with an average grain size of about 50 nm and