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P. Huang et al.
Fig. 14 Typical electric field distributions for (left) HRS and (right) LRS. Reprinted from [45]
Fig. 15 Typical temperature distribution during the CF formation. Reprinted from [45]
Figure 16 plots the LRS retention behavior of TiN/Hf/HfO X /TiN RRAM [46] and
the corresponding CF geometry. The results are compared with the experimental
data with well agreement [47]. The transportation of V O outside the CF results in
Fig. 16 Simulated LRS retention behavior of TiN/Hf/HfO x /TiN. Reprinted from [46]
P. Huang et al.
Fig. 14 Typical electric field distributions for (left) HRS and (right) LRS. Reprinted from [45]
Fig. 15 Typical temperature distribution during the CF formation. Reprinted from [45]
Figure 16 plots the LRS retention behavior of TiN/Hf/HfO X /TiN RRAM [46] and
the corresponding CF geometry. The results are compared with the experimental
data with well agreement [47]. The transportation of V O outside the CF results in
Fig. 16 Simulated LRS retention behavior of TiN/Hf/HfO x /TiN. Reprinted from [46]