534
Index
S
Sand equation, 27, 152
Satellite peak, 136, 159, 160
Scanning Electrochemical Microscopy
(SECM), 4, 464, 466
Scanning electron micrograph, 427, 431
Scanning Electron Microscopy (SEM), 60,
65, 66, 92, 136, 210, 239, 252, 260,
262, 269, 273, 277, 278, 280, 287,
292, 327, 331, 335, 378, 381, 384,
385, 392, 397, 399, 402, 408, 430,
450, 484, 485, 501, 502
Scanning Probe Lithography (SPL), 337
Scanning Transmission X-ray Microscopy
(STXM), 438
Scanning Tunneling Microscopy (STM), 4,
72, 91, 110, 113, 114, 116, 117, 119,
282, 326, 333, 455–458, 460, 465,
466
Scanning tunnelling spectroscopy, 72
Scherrer equation, 64, 189, 194
Screw dislocation, 34, 35, 41, 43, 186
Secondary Neutral Mass Spectrometry
(SNMS), 154
Sedimentation, 227, 388
Seebeck coefficient, 137, 372, 380
Segregation, 50, 191, 199, 205, 209, 221,
224–226, 278, 289–291, 409
Selective Electrodesorption-Based Atomic
Layer Deposition (SEBALD), 96, 97
Self-annealing, 191, 193, 194, 196, 197, 225,
404
Self-Assembled Monolayer (SAM), 272,
373, 411, 460
Self-assembly, 361, 362, 388–390, 400
Self-limiting, 486
Self-limiting deposition/process, 109–111
Self-lubrication, 227, 243
Self-organization, 389, 410, 486
Semiconductor, 18, 20, 35, 82–84, 86, 89,
92, 93, 95, 96, 101, 169, 328, 334,
336, 350, 371, 372, 398, 405
Sequential immersion method, 134, 137
Side branches, 437
Side branching, 277, 280
Single-bath method, 135, 138, 141, 148, 163,
165, 374
Single-Wall Carbon Nanotube (SWCNT),
511, 517, 519
Sliding angle, 268
Small-angle neutron scattering, 61
Solid Electrolyte Interface (SEI), 438
Spectrophotometry, 57
Spin coating, 388
Spin-dependent scattering, 167
Standard electrode potential, 14, 15
Standard hydrogen electrode, 13
Step edge, 33, 113–115, 119, 323, 328–330,
333, 337, 342
electrochemical step edge decoration
(ESED), 330, 332–336
step edge decoration, 328
Stransky–Krastanov type nucleation, 36, 37,
118, 119
Stress Corrosion Cracking (SCC), 283
Stress reliever, 42, 171
Stress–strain curve, 69
Stripping, 31, 83–91, 94, 97, 102, 140, 151,
292–294, 308, 324, 331, 334
Stripping peak, 31, 83–85, 87, 89–91, 93, 94,
97, 292, 293, 308, 331
Successive Ionic Layer Adsorption and
Reaction (SILAR), 80, 81
Supercapacitor, 252, 253, 295, 344, 349,
395, 398, 404, 405, 408, 500
Superconductivity, 379
Superhydrophobicity, 244, 268
Superlattice, 93, 95
Superparamagnetic iron oxide nanoparticle,
310
Superparamagnetic (SPM), 171, 246, 316,
520
Supporting electrolyte, 24, 81, 120, 274, 281,
350, 428, 429, 448, 451
Surface-area-limited (process), 80, 82–85,
88, 89, 97, 110, 123
Surface diffusion, 282–284, 289
Surface-Enhanced Raman Spectroscopy
(SERS), 394
Surface-Limited
Redox
Replacement
(SLRR), 98–111, 146
Surface reconstruction, 32, 117, 119, 121
Surface relaxation, 32, 108
Surface roughness, 30, 35, 37, 45, 46, 71,
72, 92, 102, 106, 165, 219, 222, 223,
236, 241, 245, 263, 267, 271, 375,
403, 437, 480
Surfactant, 124, 125, 169, 171, 230, 235,
236, 245, 390, 392, 411
Suspension plating, 227–229, 235, 245, 251
T
Template, 4, 259, 361, 369, 376, 380, 382,
388, 396, 397, 402, 406, 412, 478,
479, 489
Index
S
Sand equation, 27, 152
Satellite peak, 136, 159, 160
Scanning Electrochemical Microscopy
(SECM), 4, 464, 466
Scanning electron micrograph, 427, 431
Scanning Electron Microscopy (SEM), 60,
65, 66, 92, 136, 210, 239, 252, 260,
262, 269, 273, 277, 278, 280, 287,
292, 327, 331, 335, 378, 381, 384,
385, 392, 397, 399, 402, 408, 430,
450, 484, 485, 501, 502
Scanning Probe Lithography (SPL), 337
Scanning Transmission X-ray Microscopy
(STXM), 438
Scanning Tunneling Microscopy (STM), 4,
72, 91, 110, 113, 114, 116, 117, 119,
282, 326, 333, 455–458, 460, 465,
466
Scanning tunnelling spectroscopy, 72
Scherrer equation, 64, 189, 194
Screw dislocation, 34, 35, 41, 43, 186
Secondary Neutral Mass Spectrometry
(SNMS), 154
Sedimentation, 227, 388
Seebeck coefficient, 137, 372, 380
Segregation, 50, 191, 199, 205, 209, 221,
224–226, 278, 289–291, 409
Selective Electrodesorption-Based Atomic
Layer Deposition (SEBALD), 96, 97
Self-annealing, 191, 193, 194, 196, 197, 225,
404
Self-Assembled Monolayer (SAM), 272,
373, 411, 460
Self-assembly, 361, 362, 388–390, 400
Self-limiting, 486
Self-limiting deposition/process, 109–111
Self-lubrication, 227, 243
Self-organization, 389, 410, 486
Semiconductor, 18, 20, 35, 82–84, 86, 89,
92, 93, 95, 96, 101, 169, 328, 334,
336, 350, 371, 372, 398, 405
Sequential immersion method, 134, 137
Side branches, 437
Side branching, 277, 280
Single-bath method, 135, 138, 141, 148, 163,
165, 374
Single-Wall Carbon Nanotube (SWCNT),
511, 517, 519
Sliding angle, 268
Small-angle neutron scattering, 61
Solid Electrolyte Interface (SEI), 438
Spectrophotometry, 57
Spin coating, 388
Spin-dependent scattering, 167
Standard electrode potential, 14, 15
Standard hydrogen electrode, 13
Step edge, 33, 113–115, 119, 323, 328–330,
333, 337, 342
electrochemical step edge decoration
(ESED), 330, 332–336
step edge decoration, 328
Stransky–Krastanov type nucleation, 36, 37,
118, 119
Stress Corrosion Cracking (SCC), 283
Stress reliever, 42, 171
Stress–strain curve, 69
Stripping, 31, 83–91, 94, 97, 102, 140, 151,
292–294, 308, 324, 331, 334
Stripping peak, 31, 83–85, 87, 89–91, 93, 94,
97, 292, 293, 308, 331
Successive Ionic Layer Adsorption and
Reaction (SILAR), 80, 81
Supercapacitor, 252, 253, 295, 344, 349,
395, 398, 404, 405, 408, 500
Superconductivity, 379
Superhydrophobicity, 244, 268
Superlattice, 93, 95
Superparamagnetic iron oxide nanoparticle,
310
Superparamagnetic (SPM), 171, 246, 316,
520
Supporting electrolyte, 24, 81, 120, 274, 281,
350, 428, 429, 448, 451
Surface-area-limited (process), 80, 82–85,
88, 89, 97, 110, 123
Surface diffusion, 282–284, 289
Surface-Enhanced Raman Spectroscopy
(SERS), 394
Surface-Limited
Redox
Replacement
(SLRR), 98–111, 146
Surface reconstruction, 32, 117, 119, 121
Surface relaxation, 32, 108
Surface roughness, 30, 35, 37, 45, 46, 71,
72, 92, 102, 106, 165, 219, 222, 223,
236, 241, 245, 263, 267, 271, 375,
403, 437, 480
Surfactant, 124, 125, 169, 171, 230, 235,
236, 245, 390, 392, 411
Suspension plating, 227–229, 235, 245, 251
T
Template, 4, 259, 361, 369, 376, 380, 382,
388, 396, 397, 402, 406, 412, 478,
479, 489