Index
533
P
Particle incorporation, 227, 230–232, 238–
240, 243–249, 251, 252
Partition coefficient, 446
Passivation, 51, 53, 112, 192, 201, 288
Passive layer, 51–53
Permalloy, 153, 204
Perpendicular magnetization, 121, 123, 124,
137
Phase diagram, 50, 115, 402
quasi-binary phase diagram, 402
Photoelectrochemical, 495, 498
Photoelectrochemical processes, 501
Photoelectrochemistry, 253, 279, 373, 396,
397, 405
Photoluminescence spectroscopy, 57
Plasma discharge, 518
Plasma synthesis, 520
Poisson–Boltzmann equation, 16
Polarization, 18, 20, 21, 23, 26, 27, 38, 51,
52, 57, 73, 74, 98, 105, 113
Polarization curve, 23, 26, 28, 51, 74, 141,
142, 144, 282, 283, 314
Polarization resistance, 74
Polymer, 96, 110
Polymerization, 272, 277, 330, 406, 452,
453, 460
Pore branching, 478, 490–493
Pore density, 363, 364, 368, 483, 485, 490,
494
Pore diameter, 262, 266, 284, 285, 363, 364,
367–369, 375, 382–385, 410, 445,
478, 480, 481, 483, 490–492, 494,
495, 501
Pore filling, 365–367, 369, 382, 383
Pore merging, 490
Pore size, 52, 260–262, 264, 265, 286, 480
Pore widening, 484–486, 495
Porosity, 52, 94, 98, 109, 148, 184, 208, 239,
262, 266–268, 271, 278, 282, 294,
369, 396, 404, 411, 480, 482, 483,
485, 491, 493
hierarchical porosity, 267, 268, 407, 408
macroporous structures, 394–400
mesoporous structures, 384, 403–407
secondary porosity, 260, 261, 264–266,
273
three-dimensionally ordered macroporous (3DOM) structures, 388, 396,
398
Porous Anodic Alumina (PAA), 361, 363,
371, 375, 376, 381, 384, 487
Positron Annihilation Spectroscopy (PAS),
61
Post-deposition treatment, 271
Potential control, 19, 20, 72, 83, 109
Potential of zero charge, 17, 18, 110
Potentiostat, 20–22
Powder consolidation, 184
Progressive nucleation, 37–39
Pseudobinary eutectics, 386
Pseudo-spin-valve structure, 149
Pulse anodization, 491, 492, 494
Pulse-limiting current density, 186, 193
Pulse plating, 44, 49, 153, 154, 185–187,
193, 194, 196, 199–204, 219, 222,
223, 238, 239, 251, 370, 375, 454
pulsed electrodeposition, 367
Pulse-reverse plating, 148, 187, 238, 375
Q
Quantum confinement, 5, 92, 379, 380
Quasi, 434
Quasireference electrode, 19, 351, 352
R
Radiofrequecy /RF/ plasma, 513
Raman spectroscopy, 57
Ramification, 424, 428
Reconstruction, 458
Recrystallization, 175, 176, 190, 197, 200,
207, 485
Redoxi electrode, 16
Reference electrode, 13, 15, 19, 20, 22, 52,
81, 121, 143, 145, 261, 434, 442
quasireference electrode, 19, 351, 352
Regular codeposition, 47, 48, 142, 148, 152,
154, 217, 226, 332
Relative Texture Index (RTI), 65
Relaxation, 67, 123, 174, 190, 197, 480
Remanence, 245, 246, 316, 376
Resistivity, 5, 22, 169, 171, 173, 175, 191,
197, 199, 221, 225, 336, 340, 379,
426, 431
Reverse micelle, 522
Reverse pulse plating, 148, 149, 187, 205,
227, 238, 251, 265, 277, 278, 375
Root-mean-square roughness, 45
Rotating cathode, 138, 236
Rotating cylinder, 24, 139
Rotating Disc Electrode (RDE), 24, 150
Rotating Ring-Disc Electrode (RRDE), 151
Rutherford Backscattering Spectroscopy
(RBS), 62
533
P
Particle incorporation, 227, 230–232, 238–
240, 243–249, 251, 252
Partition coefficient, 446
Passivation, 51, 53, 112, 192, 201, 288
Passive layer, 51–53
Permalloy, 153, 204
Perpendicular magnetization, 121, 123, 124,
137
Phase diagram, 50, 115, 402
quasi-binary phase diagram, 402
Photoelectrochemical, 495, 498
Photoelectrochemical processes, 501
Photoelectrochemistry, 253, 279, 373, 396,
397, 405
Photoluminescence spectroscopy, 57
Plasma discharge, 518
Plasma synthesis, 520
Poisson–Boltzmann equation, 16
Polarization, 18, 20, 21, 23, 26, 27, 38, 51,
52, 57, 73, 74, 98, 105, 113
Polarization curve, 23, 26, 28, 51, 74, 141,
142, 144, 282, 283, 314
Polarization resistance, 74
Polymer, 96, 110
Polymerization, 272, 277, 330, 406, 452,
453, 460
Pore branching, 478, 490–493
Pore density, 363, 364, 368, 483, 485, 490,
494
Pore diameter, 262, 266, 284, 285, 363, 364,
367–369, 375, 382–385, 410, 445,
478, 480, 481, 483, 490–492, 494,
495, 501
Pore filling, 365–367, 369, 382, 383
Pore merging, 490
Pore size, 52, 260–262, 264, 265, 286, 480
Pore widening, 484–486, 495
Porosity, 52, 94, 98, 109, 148, 184, 208, 239,
262, 266–268, 271, 278, 282, 294,
369, 396, 404, 411, 480, 482, 483,
485, 491, 493
hierarchical porosity, 267, 268, 407, 408
macroporous structures, 394–400
mesoporous structures, 384, 403–407
secondary porosity, 260, 261, 264–266,
273
three-dimensionally ordered macroporous (3DOM) structures, 388, 396,
398
Porous Anodic Alumina (PAA), 361, 363,
371, 375, 376, 381, 384, 487
Positron Annihilation Spectroscopy (PAS),
61
Post-deposition treatment, 271
Potential control, 19, 20, 72, 83, 109
Potential of zero charge, 17, 18, 110
Potentiostat, 20–22
Powder consolidation, 184
Progressive nucleation, 37–39
Pseudobinary eutectics, 386
Pseudo-spin-valve structure, 149
Pulse anodization, 491, 492, 494
Pulse-limiting current density, 186, 193
Pulse plating, 44, 49, 153, 154, 185–187,
193, 194, 196, 199–204, 219, 222,
223, 238, 239, 251, 370, 375, 454
pulsed electrodeposition, 367
Pulse-reverse plating, 148, 187, 238, 375
Q
Quantum confinement, 5, 92, 379, 380
Quasi, 434
Quasireference electrode, 19, 351, 352
R
Radiofrequecy /RF/ plasma, 513
Raman spectroscopy, 57
Ramification, 424, 428
Reconstruction, 458
Recrystallization, 175, 176, 190, 197, 200,
207, 485
Redoxi electrode, 16
Reference electrode, 13, 15, 19, 20, 22, 52,
81, 121, 143, 145, 261, 434, 442
quasireference electrode, 19, 351, 352
Regular codeposition, 47, 48, 142, 148, 152,
154, 217, 226, 332
Relative Texture Index (RTI), 65
Relaxation, 67, 123, 174, 190, 197, 480
Remanence, 245, 246, 316, 376
Resistivity, 5, 22, 169, 171, 173, 175, 191,
197, 199, 221, 225, 336, 340, 379,
426, 431
Reverse micelle, 522
Reverse pulse plating, 148, 149, 187, 205,
227, 238, 251, 265, 277, 278, 375
Root-mean-square roughness, 45
Rotating cathode, 138, 236
Rotating cylinder, 24, 139
Rotating Disc Electrode (RDE), 24, 150
Rotating Ring-Disc Electrode (RRDE), 151
Rutherford Backscattering Spectroscopy
(RBS), 62