One-dimensional model
confinement of electrons in boxes, 104–113
classical limit, approaching, 109–110
freely moving electrons on nanowire, 111–112
Hamiltonian operator, 105, 107
line segment model, 108
normalization of wavefunction, 101, 106–109
particle-on-a-line model, 110
Pauli exclusion principle, 111
quantum mechanical tunneling, 128
One-dimensional (1D) nanomaterials
rotational dimensionalities, 9
translational dimensionality, 8–9
One-dimensional nanoscale region, energy
of electron in, 165–166
Onsager model, 146–147, 299
The Open Nanoscience Journal, 5
Operating modes, of NSOM, 324–329
Operator, defined, 102
Optical lithography (photolithography),
414–416, 414f, 428
Optical parameters del (Δ) and psi (Y), 273–274
Optical waveguide lightmode spectroscopy (OWLS), 284
Optics, nonlinear, overview, 294–300
Ordered solid (S) phase, Langmuir film, 386
Organic–inorganic hybrid electro-optics, 430–431,
430f, 432f
Mach–Zehnder electro-optic modulator, 430–431,
430f
plasmonic–organic hybrid modulator, 432
Organic molecules, conjugation in, 170–173
Organic semiconductors, 346, 346f
Orientational entropy, 44
Oscillator strengths, 186–187, 190
OTS, see Octadecyltrichlorosilane (OTS)
Overlap repulsion, 149–152
OWLS, see Optical waveguide lightmode spectroscopy
(OWLS)
P
Pair potentials, 145
Particle-in-a-box model, applications of, 164–170
Particles
on ring model, 119–121
size using scattered light, 204–207
in sphere model, 121
Path function, work, 35
Patterning, thin films, 413–420
electron beam lithography, 414–416, 414f
nanolithography, 413
nanosphere lithography, 416–417
optical lithography, 414–416, 414f
soft lithography, 416, 416f
using AFM, 417–420
Pauli exclusion principle, 111, 166, 188
PAZO, 192–193
Pb nanoparticles, melting temperature, 27–28, 27f
PDMS (polydimethylsiloxane), 416
PDMS microspotter, 428
Penetration depth, defined, 279
Perturbation, of electron clouds due to ions, 143–144
482 Index
confinement of electrons in boxes, 104–113
classical limit, approaching, 109–110
freely moving electrons on nanowire, 111–112
Hamiltonian operator, 105, 107
line segment model, 108
normalization of wavefunction, 101, 106–109
particle-on-a-line model, 110
Pauli exclusion principle, 111
quantum mechanical tunneling, 128
One-dimensional (1D) nanomaterials
rotational dimensionalities, 9
translational dimensionality, 8–9
One-dimensional nanoscale region, energy
of electron in, 165–166
Onsager model, 146–147, 299
The Open Nanoscience Journal, 5
Operating modes, of NSOM, 324–329
Operator, defined, 102
Optical lithography (photolithography),
414–416, 414f, 428
Optical parameters del (Δ) and psi (Y), 273–274
Optical waveguide lightmode spectroscopy (OWLS), 284
Optics, nonlinear, overview, 294–300
Ordered solid (S) phase, Langmuir film, 386
Organic–inorganic hybrid electro-optics, 430–431,
430f, 432f
Mach–Zehnder electro-optic modulator, 430–431,
430f
plasmonic–organic hybrid modulator, 432
Organic molecules, conjugation in, 170–173
Organic semiconductors, 346, 346f
Orientational entropy, 44
Oscillator strengths, 186–187, 190
OTS, see Octadecyltrichlorosilane (OTS)
Overlap repulsion, 149–152
OWLS, see Optical waveguide lightmode spectroscopy
(OWLS)
P
Pair potentials, 145
Particle-in-a-box model, applications of, 164–170
Particles
on ring model, 119–121
size using scattered light, 204–207
in sphere model, 121
Path function, work, 35
Patterning, thin films, 413–420
electron beam lithography, 414–416, 414f
nanolithography, 413
nanosphere lithography, 416–417
optical lithography, 414–416, 414f
soft lithography, 416, 416f
using AFM, 417–420
Pauli exclusion principle, 111, 166, 188
PAZO, 192–193
Pb nanoparticles, melting temperature, 27–28, 27f
PDMS (polydimethylsiloxane), 416
PDMS microspotter, 428
Penetration depth, defined, 279
Perturbation, of electron clouds due to ions, 143–144
482 Index