Dispersion Kinetics of Thin Double Chromium-Silver Films …
453
Fig. 5 SEM image (×3000) double chromium-silver film onto zirconia ceramics which was
annealed in vacuum: a 900 °S, 20 min; b 950 °S, 20 min; c 1000 °S, 10 min; d 1000 °S, 20
min
optimal values of the joining processes parameters of metallized oxide materials by
brazing or welding by pressure, temperature of the process, exposure time, etc.
According to the developed experimental technologies for the joining of oxides
metallized with double chromium–silver films, we have manufactured the joints
of these materials with ultra-thin solder seam 2 ÷ 4 µm thickness whose strength
reaches 100 MPa.
453
Fig. 5 SEM image (×3000) double chromium-silver film onto zirconia ceramics which was
annealed in vacuum: a 900 °S, 20 min; b 950 °S, 20 min; c 1000 °S, 10 min; d 1000 °S, 20
min
optimal values of the joining processes parameters of metallized oxide materials by
brazing or welding by pressure, temperature of the process, exposure time, etc.
According to the developed experimental technologies for the joining of oxides
metallized with double chromium–silver films, we have manufactured the joints
of these materials with ultra-thin solder seam 2 ÷ 4 µm thickness whose strength
reaches 100 MPa.