5.4 Specific Examples from the Experience of Belarusian Trojan Hunters
489
Fig. 5.10 Structural diagram of the station M-6729B
• Compatibility in terms of format of the defects list with stations for repair of masks
of type M-5xx1 or any other repair, review, or analysis station by customer’s
request.
• Automatic classification of defects by types according to the SEMI P23 standard.
• Calculation of the distance from the defect to the nearest topology element to
increase the percentage yield due to precise analysis of criticality of defects.
• Presence of the function of real-time optical pattern presentation on a separate
screen—visual channel.
• Presentation of defects to the operator in transmitted and reflected light (online).
• Saving defect images in the context of topology from the CCD camera to be
viewed in the off-line station mode.
• Viewing distribution of defects on the mask, viewing defects in the context of
design data in the off-line station mode.
• User friendly interface.
• Simple selection of the controlled section.
• System of elimination of false defects on the edges of elements.
• Semi-automatic system of masks uploading/downloading.
• Illumination system based on LED with a wavelength of X = 365 ± 5 nm.
Basic specification parameters
Testing method
Die-to-database
Minimum detectable defect size
150, 250 nm
Maximum dimensions of the working field
153 × 153 mm
(continued)
489
Fig. 5.10 Structural diagram of the station M-6729B
• Compatibility in terms of format of the defects list with stations for repair of masks
of type M-5xx1 or any other repair, review, or analysis station by customer’s
request.
• Automatic classification of defects by types according to the SEMI P23 standard.
• Calculation of the distance from the defect to the nearest topology element to
increase the percentage yield due to precise analysis of criticality of defects.
• Presence of the function of real-time optical pattern presentation on a separate
screen—visual channel.
• Presentation of defects to the operator in transmitted and reflected light (online).
• Saving defect images in the context of topology from the CCD camera to be
viewed in the off-line station mode.
• Viewing distribution of defects on the mask, viewing defects in the context of
design data in the off-line station mode.
• User friendly interface.
• Simple selection of the controlled section.
• System of elimination of false defects on the edges of elements.
• Semi-automatic system of masks uploading/downloading.
• Illumination system based on LED with a wavelength of X = 365 ± 5 nm.
Basic specification parameters
Testing method
Die-to-database
Minimum detectable defect size
150, 250 nm
Maximum dimensions of the working field
153 × 153 mm
(continued)