488
5 Methods of Detecting Hardware Trojans in Microcircuits
Fig. 5.9 Appearance of the automatic mask test station M-6729B
This test station will contain a CCD matrix with a high-resolution operating in
the DUV range, as well as a DUV light source located above the wafer, a precision
table for precise movement of the analyzed substrates and the software and hardware
complex (Fig. 5.9).
What Belarusian equipment can be used today to perform testing of foreign masks
and wafers?
As known to specialists, stations M-6729B-0.25 and M-6729B by JSC
“KBTEM-OMO” (Republic of Belarus) with control pixels of 250 nm and 150 nm,
respectively, (Fig. 5.8) are developed and widely supplied for automatic testing of
masks. Currently developed are stations with controlled pixels of 90 nm and 65 nm.
The stations are designed for automatic testing of the topology drawing on photo
masks with chromium, chromium and chromium oxide, molybdenum, iron oxide
coatings, including masks protected by pellicle. Topology control is performed in
transmitted light by comparison with the project data of Die-to-Database (D2DB).
The operation of the station is based on the principle of controlling defectiveness
of the topology on the mask by comparing it to its artificial image acquired from
project data. Block diagram of the unit is shown in Fig. 5.10.
Specific features of M-6729B
• Two thresholds of detectability—150, 300 nm.
• Control of photomasks protected with pellicle with a height of up to 6.5 mm.
• Compatibility in terms of input data format: EM-5xx9, ZBA, GDS-II, 3600F,
MEBES, etc. (by customer’s request).
5 Methods of Detecting Hardware Trojans in Microcircuits
Fig. 5.9 Appearance of the automatic mask test station M-6729B
This test station will contain a CCD matrix with a high-resolution operating in
the DUV range, as well as a DUV light source located above the wafer, a precision
table for precise movement of the analyzed substrates and the software and hardware
complex (Fig. 5.9).
What Belarusian equipment can be used today to perform testing of foreign masks
and wafers?
As known to specialists, stations M-6729B-0.25 and M-6729B by JSC
“KBTEM-OMO” (Republic of Belarus) with control pixels of 250 nm and 150 nm,
respectively, (Fig. 5.8) are developed and widely supplied for automatic testing of
masks. Currently developed are stations with controlled pixels of 90 nm and 65 nm.
The stations are designed for automatic testing of the topology drawing on photo
masks with chromium, chromium and chromium oxide, molybdenum, iron oxide
coatings, including masks protected by pellicle. Topology control is performed in
transmitted light by comparison with the project data of Die-to-Database (D2DB).
The operation of the station is based on the principle of controlling defectiveness
of the topology on the mask by comparing it to its artificial image acquired from
project data. Block diagram of the unit is shown in Fig. 5.10.
Specific features of M-6729B
• Two thresholds of detectability—150, 300 nm.
• Control of photomasks protected with pellicle with a height of up to 6.5 mm.
• Compatibility in terms of input data format: EM-5xx9, ZBA, GDS-II, 3600F,
MEBES, etc. (by customer’s request).