Fig. 9
STM experiment with electrochemical polarization causing reduction of the initial surface (left) at
V set
¼ –5 V (middle) and re-oxidation at positive tip
bias of
V reset
¼ 5 V. The Ta
2 O
5
film (deposited by RF sputtering on 100 nm metallic Ta) has been reduced in the vacuum chamber by annealing in vacuum at
300
C for 5 min in order to enable STM experiments. The
figure is reproduced from [29]
90
I. Valov et al.
STM experiment with electrochemical polarization causing reduction of the initial surface (left) at
V set
¼ –5 V (middle) and re-oxidation at positive tip
bias of
V reset
¼ 5 V. The Ta
2 O
5
film (deposited by RF sputtering on 100 nm metallic Ta) has been reduced in the vacuum chamber by annealing in vacuum at
300
C for 5 min in order to enable STM experiments. The
figure is reproduced from [29]
90
I. Valov et al.