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Contents
2.12.3 Structural Consequences of Alloy Formation . . . . . . . . 50
2.13 Behaviour of Metals During Anodic Polarization . . . . . . . . . . . . . 51
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 53
3 Experimental Methods in Characterization of Nanosystems . . . . . . . 55
3.1 The Nature of Such Methodological Overviews . . . . . . . . . . . . . . . 55
3.2 Non-destructive Analysis Methods with Irradiation . . . . . . . . . . . . 56
3.2.1
Classification of the Irradiation-Based Methods . . . . . . 56
3.2.2
Diffraction Methods . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62
3.2.3
Methods Involving Ionization and Used
for Chemical Analysis . . . . . . . . . . . . . . . . . . . . . . . . . . . . 65
3.3 Thermal Analysis . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 67
3.4 Mechanical Tests . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 68
3.5 Scanning Probe Methods . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 71
3.6 Corrosion Studies . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 73
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 75
Part II Nanostructured Materials Obtained by Using
Non-structured Substrates of Large Surface Area
4 Ultrathin Layers . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 79
4.1 Layer Preparation Methods Based Solely on UPD Processes . . . . 79
4.1.1
Atomic Layer Deposition Processes . . . . . . . . . . . . . . . . 79
4.1.2
Layer-by-Layer Electrodeposition Based on ALD . . . . 81
4.1.3
Optimization of the EC-ALD Processes . . . . . . . . . . . . . 83
4.1.4
Characterization of the Composition, Structure
and Semiconductor Properties of EC-ALD Layers . . . . 89
4.1.5
Multicomponent and Superlattice Structures
Obtained with EC-ALD . . . . . . . . . . . . . . . . . . . . . . . . . . 93
4.1.6
Various Nanostructure Deposition Processes
Based on UPD Principles . . . . . . . . . . . . . . . . . . . . . . . . . 96
4.2 Combination of UPD with Other Surface-Area-Limited
Processes . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 98
4.2.1
Surface-Limited Redox Replacement Processes . . . . . . 98
4.2.2
Substrates and Displacement Pairs in SLRR
Processes . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 100
4.2.3
Structural Aspects of the SLRR Processes . . . . . . . . . . . 104
4.2.4
Application of SLRR Deposits . . . . . . . . . . . . . . . . . . . . . 107
4.3 Non-UPD Deposition of Ultrathin Metallic Layers . . . . . . . . . . . . 109
4.3.1
Electrodeposition of Ultrathin Layers
with Self-limiting Processes . . . . . . . . . . . . . . . . . . . . . . . 109
4.3.2
Atomic-Scale Observation of the Initial Phase
of the Layer Growth . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 112
4.3.3
Magnetization of Ultrathin Electrodeposited
Layers . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 119
References . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 126