References
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38. Yoshitake M, Aparna Y, Yoshihara K (2001b) Tailoring of work function by surface segregation.
Appl Surf Sci 169–170:666–670
39. Aparna Y, Yoshitake M, Yoshihara K (2000) Work function and surface segregation study on
Nb/Ti/Cu multilayer films. Jpn J Appl Phys 39:4447–4450
40. Lu CH, Wong GMT, Deal MD, Tsai W, Majhi P, Chui CO, Visokay MR, Chambers JJ, Colombo
L, Clemens BM, Nishi Y (2005) Characteristics and mechanism of tunable work function
gate electrodes using a bilayer metal structure on SiO 2 /and HfO 2 . IEEE Electron Device Lett
26:445–447
69
38. Yoshitake M, Aparna Y, Yoshihara K (2001b) Tailoring of work function by surface segregation.
Appl Surf Sci 169–170:666–670
39. Aparna Y, Yoshitake M, Yoshihara K (2000) Work function and surface segregation study on
Nb/Ti/Cu multilayer films. Jpn J Appl Phys 39:4447–4450
40. Lu CH, Wong GMT, Deal MD, Tsai W, Majhi P, Chui CO, Visokay MR, Chambers JJ, Colombo
L, Clemens BM, Nishi Y (2005) Characteristics and mechanism of tunable work function
gate electrodes using a bilayer metal structure on SiO 2 /and HfO 2 . IEEE Electron Device Lett
26:445–447