structures, (2) applications that transcend beyond simple extrapolation of MEMS to
smaller length scales, (3) the actual electromechanical properties at nanometer
scales and (4) actuation and sensing on a submicron scale.
Given the scope of the review and its focus on the techniques of nanolithography
and nanomanipulation, we are not in a position to discuss these fields extensively.
We mention some examples of recent progress in the fabrication of NEMS structures. Until now most of the NEMS structures have been made by innovative extensions of the techniques used for MEMS fabrications, like optical and e-beam
lithography and anisotropic etching. The real 3D mechanical structures fabricated
and investigated generally have a smallest length in the range of a few hundreds of
nm (b250 nm). The new challenge is to use the techniques of nanolithography
and nanomanipulation, described above, to fabricate NEMS structures. In principle, anodic oxidation and the DPN route can produce nanoscale masks for such
processes. There are reports of the fabrication of NEMS structures on Si with
length scales around 200–400 nm using aluminum masks fabricated using AFMbased local oxidation [101]. The fabrication of NEMS structures using nanolithograhy and nanomanipulation is in its infancy. It is expected that this field will
grow, however, there are important road blocks which need to be attended to before
any tangible progress can be made.
Acknowledgements
The author wants to thank Mr. M. A. Paranjape, Ms. L. K. Brar and Ms. S. Kar for
their help in the preparation of this manuscript.
References
1 Microlithography Science and Technology,
eds. J. R. Sheats, B. W. Smith,
Marcel Dekker, New York 1998.
2 R. Coontz, P. Szuromi, Science, 2000,
290, 1523–1539.
3 Handbook of Nanostructured Materials
and Nanotechnology, ed. H. S. Nalwa,
Academic Press, New York. 2002.
4 G. E. Possin, Rev. Sci. Instrum., 1970,
41, 772–77; W. D. Williams, N.
Giordano, Phys. Rev. B, 1986, 33,
8146–8154.
5 R. Fleisher, P. B. Price, R. M.
Walker, Nuclear Tracks in Solids,
University of California Press,
Berkeley 1975; R. Spohr, Ion Tracks
and Microtechnology: Basic Principles
and Applications, Vieweg, Wiesbaden
1990, 1–272.
6 P. Yu. Apel, A. Schulz, R. Spohr
et al., Nucl. Instrum. Methods Phys. Res.
Sect. B, 1997, 130, 55–63.
7 P. Yu. Apel, A. Yu. Didyk, A. G.
Salina, Nucl. Instrum. Methods Phys.
Res. Sect. B, 1996, 107, 276–280.
8 P. Yu. Apel, I. V. Blonskaya, A. Yu.
Didyk et al., Nucl. Instrum. Methods
Phys. Res. Sect. B, 2001, 179, 55–62.
9 R. Mishra, S. P. Tripathy, A.
Kulshrestha et al., Pramana, 2000,
54, 777–784.
10 F. Keller, M. S. Hunter, D. L.
Robinson, J. Electrochem. Soc., 1953,
100, 411–419.
11 Y. Li, G. W. Meng, L. D. Zhang et al.,
Appl. Phys. Lett., 2000, 76, 2011–2013.
12 T. Xu, G. Zangari, R. M. Metzger,
Nano Lett., 2002, 2, 37–41.
21 Nanolithography and Nanomanipulation
720
smaller length scales, (3) the actual electromechanical properties at nanometer
scales and (4) actuation and sensing on a submicron scale.
Given the scope of the review and its focus on the techniques of nanolithography
and nanomanipulation, we are not in a position to discuss these fields extensively.
We mention some examples of recent progress in the fabrication of NEMS structures. Until now most of the NEMS structures have been made by innovative extensions of the techniques used for MEMS fabrications, like optical and e-beam
lithography and anisotropic etching. The real 3D mechanical structures fabricated
and investigated generally have a smallest length in the range of a few hundreds of
nm (b250 nm). The new challenge is to use the techniques of nanolithography
and nanomanipulation, described above, to fabricate NEMS structures. In principle, anodic oxidation and the DPN route can produce nanoscale masks for such
processes. There are reports of the fabrication of NEMS structures on Si with
length scales around 200–400 nm using aluminum masks fabricated using AFMbased local oxidation [101]. The fabrication of NEMS structures using nanolithograhy and nanomanipulation is in its infancy. It is expected that this field will
grow, however, there are important road blocks which need to be attended to before
any tangible progress can be made.
Acknowledgements
The author wants to thank Mr. M. A. Paranjape, Ms. L. K. Brar and Ms. S. Kar for
their help in the preparation of this manuscript.
References
1 Microlithography Science and Technology,
eds. J. R. Sheats, B. W. Smith,
Marcel Dekker, New York 1998.
2 R. Coontz, P. Szuromi, Science, 2000,
290, 1523–1539.
3 Handbook of Nanostructured Materials
and Nanotechnology, ed. H. S. Nalwa,
Academic Press, New York. 2002.
4 G. E. Possin, Rev. Sci. Instrum., 1970,
41, 772–77; W. D. Williams, N.
Giordano, Phys. Rev. B, 1986, 33,
8146–8154.
5 R. Fleisher, P. B. Price, R. M.
Walker, Nuclear Tracks in Solids,
University of California Press,
Berkeley 1975; R. Spohr, Ion Tracks
and Microtechnology: Basic Principles
and Applications, Vieweg, Wiesbaden
1990, 1–272.
6 P. Yu. Apel, A. Schulz, R. Spohr
et al., Nucl. Instrum. Methods Phys. Res.
Sect. B, 1997, 130, 55–63.
7 P. Yu. Apel, A. Yu. Didyk, A. G.
Salina, Nucl. Instrum. Methods Phys.
Res. Sect. B, 1996, 107, 276–280.
8 P. Yu. Apel, I. V. Blonskaya, A. Yu.
Didyk et al., Nucl. Instrum. Methods
Phys. Res. Sect. B, 2001, 179, 55–62.
9 R. Mishra, S. P. Tripathy, A.
Kulshrestha et al., Pramana, 2000,
54, 777–784.
10 F. Keller, M. S. Hunter, D. L.
Robinson, J. Electrochem. Soc., 1953,
100, 411–419.
11 Y. Li, G. W. Meng, L. D. Zhang et al.,
Appl. Phys. Lett., 2000, 76, 2011–2013.
12 T. Xu, G. Zangari, R. M. Metzger,
Nano Lett., 2002, 2, 37–41.
21 Nanolithography and Nanomanipulation
720