I am immenensely grateful to Dr. Malkiat Johal for the opportunites to
collaborate on this textbook and to teach at Pomona and for over a decade
of mentorship and friendship, as well as to our executive editor, Lou M.
Han, for his advice and patience during the writing process. I also greatly
appreciate the advice and mentorship of many colleagues, including but
not limited to Dr. Bruce Robinson, Dr. Larry Dalton, Dr. Delwin Elder,
Dr. Charlie Campbell, and Dr. Tom Engel (UW); Dr. Mukesh Arora,
Dr. Cynthia Selassie, Dr. Wayne Steinmetz, and Dr. Richard Hazlett
(Pomona); Dr. Simone Raugei, Bojana Ginovska, Dr. Peter Sushko,
Dr. Niri Govind, Dr. Chris Mundy, Dr. Greg Schenter, Dr. Shawn
Kathmann, and Dr. John Jaffe (PNNL), and Dr. James Farr (NOAA). I also
thank Dr. Nicholas Bigelow (Intel) for many years of friendship, scientific
collaboration, and for advice regarding sections related to lithography
and semiconductor fabrication, as well as Dr. Stephanie Benight (Exponent), Dr. Andreas Tillack (ORNL), Dr. Jason Kingsbury (Cal Lutheran),
and Dr. Jason Sellers (REC Silicon) for useful discussion and many years
of collaboration and friendship. I am also grateful to my students and
interns at both Pomona and UW, especially Hannah Wayment-Steele,
Conner Kummerlowe, and Dr. Luke Latimer. I also thank Katie Lane for
useful discussion, production editor Jonathan Achorn and his staff at MTC
for their patient and meticulous work typesetting the book, and Wayward
Coffeehouse in Seattle for providing a great place to write. Finally, I am
grateful for my family and many other friends for their patience during the
ups and downs of the writing process.
L. E. J.
xxii
Acknowledgments
collaborate on this textbook and to teach at Pomona and for over a decade
of mentorship and friendship, as well as to our executive editor, Lou M.
Han, for his advice and patience during the writing process. I also greatly
appreciate the advice and mentorship of many colleagues, including but
not limited to Dr. Bruce Robinson, Dr. Larry Dalton, Dr. Delwin Elder,
Dr. Charlie Campbell, and Dr. Tom Engel (UW); Dr. Mukesh Arora,
Dr. Cynthia Selassie, Dr. Wayne Steinmetz, and Dr. Richard Hazlett
(Pomona); Dr. Simone Raugei, Bojana Ginovska, Dr. Peter Sushko,
Dr. Niri Govind, Dr. Chris Mundy, Dr. Greg Schenter, Dr. Shawn
Kathmann, and Dr. John Jaffe (PNNL), and Dr. James Farr (NOAA). I also
thank Dr. Nicholas Bigelow (Intel) for many years of friendship, scientific
collaboration, and for advice regarding sections related to lithography
and semiconductor fabrication, as well as Dr. Stephanie Benight (Exponent), Dr. Andreas Tillack (ORNL), Dr. Jason Kingsbury (Cal Lutheran),
and Dr. Jason Sellers (REC Silicon) for useful discussion and many years
of collaboration and friendship. I am also grateful to my students and
interns at both Pomona and UW, especially Hannah Wayment-Steele,
Conner Kummerlowe, and Dr. Luke Latimer. I also thank Katie Lane for
useful discussion, production editor Jonathan Achorn and his staff at MTC
for their patient and meticulous work typesetting the book, and Wayward
Coffeehouse in Seattle for providing a great place to write. Finally, I am
grateful for my family and many other friends for their patience during the
ups and downs of the writing process.
L. E. J.
xxii
Acknowledgments
