4.3 Group III Nitride LED Epitaxial Technology
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it is necessary to quickly switch the source gas during the growth process. Each
corresponding organic source gas line has a vent line that allows the gas to stabilize
to a suitable state before switching (Fig. 4.1).
(2) Reactor and heater system
The reaction chamber is the heart of the entire MOCVD equipment. According to
the structure of the reaction chamber, it can be divided into two types, vertical and
horizontal. The reactants in the vertical reaction chamber are injected vertically from
the top injector onto the rotating substrate. The laminar flow of the substrate surface
is achieved by varying the flow rate of the reactants, the rotational speed of the
substrate, the pressure, the temperature, and the like. The direction of injection of
the reactants in the horizontal chamber is parallel to the substrate which is placed
Fig. 4.1 Schematic diagram of the MOCVD source gas delivery system [11]
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it is necessary to quickly switch the source gas during the growth process. Each
corresponding organic source gas line has a vent line that allows the gas to stabilize
to a suitable state before switching (Fig. 4.1).
(2) Reactor and heater system
The reaction chamber is the heart of the entire MOCVD equipment. According to
the structure of the reaction chamber, it can be divided into two types, vertical and
horizontal. The reactants in the vertical reaction chamber are injected vertically from
the top injector onto the rotating substrate. The laminar flow of the substrate surface
is achieved by varying the flow rate of the reactants, the rotational speed of the
substrate, the pressure, the temperature, and the like. The direction of injection of
the reactants in the horizontal chamber is parallel to the substrate which is placed
Fig. 4.1 Schematic diagram of the MOCVD source gas delivery system [11]