94
Analyse et technologie des surfaces
[5.3] BEHRISCH R., ed. Sputtering by Particle Bombardment I: Sputtering of Single-Element Solids.
Topics of Applied Physics, ed. H.K.V. Lotsch, vol. 47, Springer: Berlin, 1981.
[5.4] BEHRISCH R., ed. Sputtering by Particle Bombardment II: Sputtering of alloys and compounds, electron and neutron sputtering, surface topography. Topics in Applied Physics, ed.
H.K.V. Lotsch, vol. 52, Springer: Berlin, 1983.
[5.5] WILSON R.G., F.A. STEVIE, et C.W. MAGEE, Secondary Ion Mass Spectrometry – A Practical
Handbook for Depth Profiling and Bulk Impurity Analysis, New York, John Wiley & Sons,
1989.
[5.6] SLODZIAN G. et J.F. HENNEQUIN, C.R. Acad. Sci, 263, p. 1246, 1966.
[5.7] EBERHART J.P., Analyse structurale et chimique des matériaux, Paris: Dunod, 1989.
[5.8] SCHUELER B.W., «Microscope imaging by time-of-flight secondary ion mass spectrometry »,
Microsc. Microanal. Microstruct., 3, pp. 119-139, 1992.
[5.9] OECHSNER H., «Secondary neutral mass spectrometry (SNMS) – recent methodical progress
and applications to fundamental studies in particle /surface interaction», Int. J. Mass Spectrometry and Ion Processes, 143, pp. 271-282, 1995.
[5.10] MATHIEU H.J. et D. LÉONARD, Use of Post-ionisation Techniques to Complement SIMS Analysis. A Review with Practival Aspects. High Temperature Materials, 17(1-2), pp. 29-44, 1998.
[5.11] BERNERON R. et H. HOCQUAUX, «Spectroscopie à décharge luminescente», in Methodes
Usuelles de Caractérisation des Surfaces, D. David and R. Caplain, Editors, Eyrolles, Paris,
pp. 91-101, 1988.
[5.12] MARCUS R.K., ed. Glow Discharge Spectroscopies. Modern Analytical Chemistry, ed.
H.D.M., Plenum Press, New York, 1993.
[5.13] BENGTSON A., «Quantitative depth profile analysis by glow discharge – A review». Spectrochimica Acta, 49B(4), pp. 411-429, 1994.
[5.14] PAYLING R., JONES D.G. et BENGTSON A., eds, Glow Discharge Optical Emission Spectroscopy, John Wiley & Sons, Chichester, 1997.
[5.15] HOCQUAUX H., Thin Film Analysis, in Glow Discharge Spectroscopy, R.K. Marcus, Editor,
Plenum Press, New York, pp. 329, 1990.
[5.16] GRIMM W., Spectrochim. Acta, 23B, p. 443, 1968.
[5.17] LÉONARD D. et al., «TOF-SIMS and XPS study of photoactivatable reagents designed for surface glyoengineering. Part I: N-[m-[3-(trifluoromethyl) diazirin-3-yl] phenyl] -4-maleimidobutyramide) (MAD) on silicon, silicon nitride and diamond », Surface and Interface Analysis,
26, pp. 783-793, 1998.
Analyse et technologie des surfaces
[5.3] BEHRISCH R., ed. Sputtering by Particle Bombardment I: Sputtering of Single-Element Solids.
Topics of Applied Physics, ed. H.K.V. Lotsch, vol. 47, Springer: Berlin, 1981.
[5.4] BEHRISCH R., ed. Sputtering by Particle Bombardment II: Sputtering of alloys and compounds, electron and neutron sputtering, surface topography. Topics in Applied Physics, ed.
H.K.V. Lotsch, vol. 52, Springer: Berlin, 1983.
[5.5] WILSON R.G., F.A. STEVIE, et C.W. MAGEE, Secondary Ion Mass Spectrometry – A Practical
Handbook for Depth Profiling and Bulk Impurity Analysis, New York, John Wiley & Sons,
1989.
[5.6] SLODZIAN G. et J.F. HENNEQUIN, C.R. Acad. Sci, 263, p. 1246, 1966.
[5.7] EBERHART J.P., Analyse structurale et chimique des matériaux, Paris: Dunod, 1989.
[5.8] SCHUELER B.W., «Microscope imaging by time-of-flight secondary ion mass spectrometry »,
Microsc. Microanal. Microstruct., 3, pp. 119-139, 1992.
[5.9] OECHSNER H., «Secondary neutral mass spectrometry (SNMS) – recent methodical progress
and applications to fundamental studies in particle /surface interaction», Int. J. Mass Spectrometry and Ion Processes, 143, pp. 271-282, 1995.
[5.10] MATHIEU H.J. et D. LÉONARD, Use of Post-ionisation Techniques to Complement SIMS Analysis. A Review with Practival Aspects. High Temperature Materials, 17(1-2), pp. 29-44, 1998.
[5.11] BERNERON R. et H. HOCQUAUX, «Spectroscopie à décharge luminescente», in Methodes
Usuelles de Caractérisation des Surfaces, D. David and R. Caplain, Editors, Eyrolles, Paris,
pp. 91-101, 1988.
[5.12] MARCUS R.K., ed. Glow Discharge Spectroscopies. Modern Analytical Chemistry, ed.
H.D.M., Plenum Press, New York, 1993.
[5.13] BENGTSON A., «Quantitative depth profile analysis by glow discharge – A review». Spectrochimica Acta, 49B(4), pp. 411-429, 1994.
[5.14] PAYLING R., JONES D.G. et BENGTSON A., eds, Glow Discharge Optical Emission Spectroscopy, John Wiley & Sons, Chichester, 1997.
[5.15] HOCQUAUX H., Thin Film Analysis, in Glow Discharge Spectroscopy, R.K. Marcus, Editor,
Plenum Press, New York, pp. 329, 1990.
[5.16] GRIMM W., Spectrochim. Acta, 23B, p. 443, 1968.
[5.17] LÉONARD D. et al., «TOF-SIMS and XPS study of photoactivatable reagents designed for surface glyoengineering. Part I: N-[m-[3-(trifluoromethyl) diazirin-3-yl] phenyl] -4-maleimidobutyramide) (MAD) on silicon, silicon nitride and diamond », Surface and Interface Analysis,
26, pp. 783-793, 1998.