174
Compact Models for Integrated Circuit Design
b. Write down the expressions for the inversion carrier density n(0)
and n(L) in terms of the surface potential f ss , bulk potential f B ,
and the appropriate channel potential V ch (y) at the respective
terminal.
c. Assuming that the depth of the inversion layer is given by
X
v K
qN
inv
k T
s i
bss
=
ε
φ
0 2
, show that the subthreshold region drain
current is given by Equation 4.114; where the parameters have
their usual meanings as described in Section 4.4.4.4.
d. Following the procedure in Section 4.4.4.4, show that I ds is given
by Equation 4.118.
e. In the subthreshold region, a MOSFET device includes an oxide
capacitor C ox in series with a depletion capacitor C d and any
change in gate voltage V gs causes corresponding change in f ss ;
consider a voltage divider between C ox and C d , and show that the
ideality factor n is given by Equation 4.121.
f. Show that the final I ds in the subthreshold region is given by
Equation 4.122.
Compact Models for Integrated Circuit Design
b. Write down the expressions for the inversion carrier density n(0)
and n(L) in terms of the surface potential f ss , bulk potential f B ,
and the appropriate channel potential V ch (y) at the respective
terminal.
c. Assuming that the depth of the inversion layer is given by
X
v K
qN
inv
k T
s i
bss
=
ε
φ
0 2
, show that the subthreshold region drain
current is given by Equation 4.114; where the parameters have
their usual meanings as described in Section 4.4.4.4.
d. Following the procedure in Section 4.4.4.4, show that I ds is given
by Equation 4.118.
e. In the subthreshold region, a MOSFET device includes an oxide
capacitor C ox in series with a depletion capacitor C d and any
change in gate voltage V gs causes corresponding change in f ss ;
consider a voltage divider between C ox and C d , and show that the
ideality factor n is given by Equation 4.121.
f. Show that the final I ds in the subthreshold region is given by
Equation 4.122.
