Surface Modification of Textiles with Nanomaterials …
11
porosity of the coated nanoparticle/nanocomposite, super hydrophobic nature can be
incorporated onto the textile. The result of such modifications incorporates textile
characteristics like dirt free, anti-icing and separation of mixtures of oil and water
[69].
Antibacterial properties were incorporated into cotton fibres when treated with
silver, gold nanoparticles and hexadecyltrimethoxysilane in addition to offering
improved hydrophobicity and UV protective fabric [70]. Textiles finished with
Ag-TiO 2 nanocomposites along with the polysilicane compounds/polymers exhibit
enhanced aforementioned characteristics along with washing durability. The alkoxy
group covalently bonds to polysiloxanes on the surface of the textile. Other
compounds that effectively furnishes antibactericidal properties include triclosan,
N-halamines, ammonium compounds and phosphonium salts [71].
Hence, the multi-faceted development in technology has modified the contemporary textile, an irreplaceable all-time commodity of human kind with the incorporation of multiple functionalities. The procedure involved and the imparted characteristics to be deployed in various fields are discussed in detail. Moreover, various
techniques used for surface modification are also discussed in detail. Finally, surface
modified textiles for applications like energy harvesting [72], UV filtering [73], electromagnetic interference shielding [74], healthcare and environmental monitoring
[75] are highlighted.
3 Surface Modification Techniques
3.1 Sputtering
Sputtering is a widely used PVD technique that offers uniform coating and high
purity thin films. Textiles can easily be sputter coated using radio frequency (RF)
sputtering technique. There are several other types of sputtering such as DC sputtering, magnetron sputtering, and reactive sputtering, to name a few. But, the choice of
the technique relies on the application and the type of thin film material to be coated
[76]. Since textile is a dielectric medium, RF sputtering would be of more suitable
option. It can also be combined with the reactive and magnetron sputter techniques
depending on the applications like antimicrobial, UV protection and photocatalytic
[77].
Sputtering involves the use of very high vacuum environments to ensure high
purity thin films. The most commonly used pumps to generate vacuum include rotary
vane pumps, molecular drag pumps, turbo molecular pumps, ion pumps and diffusion
pumps. The selection of the pump depends on the operating pressure required for
the particular deposition. Once the required pressure is reached, argon gas is purged
into the vacuum chamber. This marks the initialization of the process. The argon
gas reacts with the free electron in the chamber and forms Ar
2+ and 2e
− [58]. The
set-up also includes positive and negative terminals, the anode and the cathode,
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