3 Catalysts via Atomic Layer Deposition
87
Table 3.2
(continued)
Metal oxide catalyst
Precursor
Deposition temperature
Support
Catalytic reaction
CoO
x [108–115]
Co(Cp)
2 –O
3 [108–115]
150 °C [108, 111, 113–115]
280 °C [109, 110]
465 °C [112]
SBA-15 [109]
TiO
2 [110, 113]
Al
2 O
3 [111]
Anodic Al
2 O
3 [112]
Au [114]
Epoxidation reaction of
styrene [109]
Photocatalytic hydrogen
production [110]
CO oxidation [108, 111]
Oxidative MMP
decomposition reactions
[112]
Photoelectrochemical [113]
electrochemical [114]
Photoelectrochemical water
splitting [115]
FeO
x [116–120]
FeCp
2 –O
3 [116, 118]
FeCp
2 –O
2 [117, 120]
Fe
2 (O t
Bu)
6 –H
2 O [119]
150 °C [117, 120]
180 °C [119]
230 °C [118]
Al
2 O
3 [116, 117]
CNT [118]
TiSi
2 [119]
C [120]
The selective hydrogenation
of cinnamaldehyde [116]
1,3-butadiene hydrogenation
[117]
Selective reductive coupling
reaction to synthesize imine
[118]
Solar water splitting [119]
Dehydrogenation of formic
acid [120]
NiO
x [121–123]
Ni(Cp)
2 –O
2 [121, 122]
Ni(CP)
2 -O
3 [123]
150 °C [123]
260 °C [121, 122]
SiO
2 [121]
Al
2 O
3 [122, 123]
CO oxidation [121–123]
MgO [124]
Cp
2 Mg–H
2 O [124]
200 °C [124]
Al
2 O
3 [124]
Furfural hydrogenation [124]
In
2 O
3 [125]
InCp–H
2 O
2 [125]
200 °C [125]
Si [125]
Electrochemical [125]
(continued)