3 Catalysts via Atomic Layer Deposition
85
Table 3.2
ALD processes for metal oxide catalyst and the corresponding catalytic reaction
Metal oxide catalyst
Precursor
Deposition temperature
Support
Catalytic reaction
Al
2 O
3 [30, 78–91]
TMA-H
2 O [30,
78–91]
30 °C [81]
100 °C [89]
150 °C [30, 80, 90]
160 °C [79]
200 °C [78, 82–88, 91]
Zeolites [78]
ANTs [30, 80]
CNT [79]
Al
2 O
3 [81, 83–85, 88, 91]
SiO
2 [82, 87]
CuCr
2 O
4 –CuO [86]
TiO
2 [89, 90]
n-alkane hydroconversion
[78]
Cinnamaldehyde and
nitrobenzene hydrogenation
reactions [30, 79]
Hydrogenation reactions of
4-nitrophenol [80]
Furfural hydrogenation [84,
81, 86–88]
Methanol decomposition [82]
Oxidative dehydrogenation of
ethane to ethylene [83]
Hydrogenation of
1,3-butadiene [85]
Photooxidation and
photoreduction [89]
CO oxidation [90]
DRM [91]
ZnO [92–96]
DEZ-H
2 O [92–96]
150 °C [92, 95]
180°C [94]
200°C [93]
Al
2 O
3 [92]
TiO
2 [93, 96]
ZSM-5 [94]
CuO [95]
Aqueous phase reforming of
1-propanol [92]
Photo-induced degradation
[93] Chichibabin reaction
[94]
CO
2 photoreduction [95]
Photochemical catalysis [96]
(continued)