74
R. Chen et al.
Table 3.1
(continued)
Metal catalyst
Precursor
Deposition temperature
Support
Catalytic reaction
Ni [37, 38, 41, 42]
NiCp
2 –H
2 O [41]
NiCp
2 –H
2 [37, 42]
NiCp
2 –O
3 -reduction [38]
200 °C [38]
250 °C [41]
300 °C [37,
42]
Al
2 O
3 [37]
SiO
2 [41, 42]
Al
2 O
3 nanotube (ANT) [38]
DRM [41]
Propylene hydrogenation and
hydrogenolysis [37]
Hydrogenation of aryl nitro
compounds [42]
Selective hydrogenation of
cinnamaldehyde [38]
Cu [45, 46, 165]
Cu(thd)
2 –O
2 –H
2 [45, 165]
[Cu( s
Bu-amd)]–H
2 [46]
160 °C [45,
165]
185 °C [46]
SiO
2 [45, 46, 165]
Water–gas shift [165]
Reverse water–gas shift [45]
Phenol degradation [46]
Co [47]
Co(acac)
2 –O
3 [47]
400 °C [47]
Ƴ-Al 2 O
3 [47]
Fischer–Tropsch synthesis
[47]