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R. Chen et al.
substrate also deteriorates the deposition uniformity. The ultimate solutions hinge
critically on the development of new ALD processes and equipment to accelerate
deposition rate and utilization efficiency of precursors.
Acknowledgements The authors gratefully thank Yun Lang, Miao Gong, Jiaming Cai, Kai Qu, and
Yuanting Tang for assisting the collection and organization of corresponding figures and references.
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