Ostwald ripening, 146
4,4
0 -Oxydianiline (ODA), 31
P
PEO-PPO-PEO, quasi-equilibrium
kinetics, 110
trans-2-Phenyl-1,3-dioxane glycidyl ether
(PDGE), 14
1-Phenylethyl phenyldithioacetate, 25
Photodiodes, 236
Phototransistors, 236
Pluronics micelles, 135
PMMA, 23
Poly(alkyl methacrylate)s, 17
Poly(3-alkylthiophene) (P3AT), 203
Poly(butyl acrylate), 26, 27
Poly(butyl acrylate)-b-poly(acrylic acid)
(PBA-PAA), 118, 139
Poly(butylene oxide), 118
Poly(3-butylthiophene) (P3BT), 205
Poly(β-p-chlorobenzyl-L-aspartate)/
trichloroethylene (PClBLA/TCE), 165
Poly(2-diethylamino ethyl methacrylate)–poly
(dimethylaminoethyl methacrylate), 140
Poly[(9,9-dioctylfluorenyl-2,7-diyl)alt-co-(9-hexyl-3,6-carbazole)], 215
Poly{[9,9-dioctylfluorenyl-2,7-diyl]-co[1,4-benzo-(2,1,3)-thiadiazole]}, 215
[1,4-diphenylenevinylene-2-methoxy5-(2-ethylhexyloxy)-benzene]}, 215
Poly(3,4-ethylenedioxythiophene)
(PEDOT), 203, 206
Poly(ethylene glycol)-b-poly(L-alanine)
(PEG-b-L-PA), 178
Poly(ethylene oxide)-b-poly(ε-carbobenzoxyL-lysine) (PEO-b-PZLys), 175
Poly(ethylene oxide)–poly(2-diethylamino)
ethyl methacrylate) (PEO-PDEA), 141
Poly(ethylene oxide-b-2-hydroxypropyl
methacrylate) (PEO-b-PHPMA), 24
Poly(ethylene-alt-propylene) (PEP), 111
Poly(ethylene-alt-propylene)–poly(ethylene
oxide) (PEP-PEO), 66, 109
Poly(ethylethylene) (PEE), 111
Poly(ferrocenylsilane)-b-PBLG
(PFS-b-PBLG), 174
Poly(Glu), 30
Poly(3-hexylthiophene) (P3HT), 206
Poly(2-hydroxypropyl methacrylate)
(PHPMA), 24
Poly(isocyano-L-alanine-L-alanine), 189
Poly(isocyano-L-alanine-L-histidine), 189
Poly(n-isopropylacrylamide) (PNIPAM), 26
Poly(N-isopropylacrylamide)–poly
(2-diethylamino ethyl methacrylate)
(PNIPAM-PDEA), 137
Poly(L-lysine)-b-poly(L-leucine)
(PLL-b-PLeu), 180
Poly(2-(methacryloyloxy)ethyl
phosphorylcholine)–poly
(2-(diisopropylamino)ethyl
methacrylate) (PMPCPDPA), 142
1,4-(1-cyanovinylenephenylene)]co-[2,5-bis(N,N
0 -diphenylamino)1,4-phenylene]}, 214
Poly[2-methoxy-5-(2
0 -ethylhexyloxy)p-phenylenevinylene] (MEH-PPV), 203
Poly(α-methylstyrene)–poly(vinyl phenethyl
alcohol) (PαMS-PVPA), 135
Poly(3-methylthiophene) (P3MT), 205, 209
Poly(β-phenethyl-L-aspartate)/
trichloroethylene/dichloroacetic acid
(PPLA/TCE/DCA), 165
Poly( p-phenylenevinylene) (PPV), 203
Poly(sodium 4-styrenesulfonate), 36
Poly(styrene), 26
Poly(styrene-b-ethylene/butylene-b-styrene)
(SEBS), 138
Poly(styrene-b-ethylene/propylene) (SEP), 138
Poly(4-vinylbenzoic acid)–poly
(N-morpholinoethyl methacrylate)
(PVBA-PMEMA), 141
Polyallylamine-g-PMLG, 184
Polyamide dendrons, 32
Polycondensation, microreactor, 31
Polydispersity, 23, 33, 88, 109, 120, 167, 186
Polyglycerols, hyperbranched, 30
1,4-Polyisoprene (PI), 111
Polymerization, anionic, 13
cationic, vinyl monomers, 4
controlled, 1
electrochemical, 204
free-radical, flow microreactor, 21
nitroxide-mediated radical (NMP), 22, 26
radical, 21
RAFT, 22, 24
Ziegler–Natta, 33
Polymer membranes, microchannels, 36
Polypeptide block copolymers,
hydrogels, 177
Polypeptide liquid crystals, 159, 163
Polystyrene 310 -b-poly(acrylic acid) 52
(PS 310 -b-PAA 52 ), 150
Index
247
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