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98. Kaminska I, Jonsson-Niedziolka M, Kaminska A, Pisarek M, Hołyst R, Opallo M, NiedziolkaJonsson J (2012) J Phys Chem C 116:22476–22485
99. Nakabayashi S, Aogaki R, Karantonis A, Iguchi U, Ushida K, Nawa M (1999) J Electroanal
Chem 473:54–58
100. Tada E, Oishi Y, Kaneko H (2005) Electrochem Solid-State Lett 8:C26–C29
101. Budevski E, Staikov G, Lorentz WJ (1996) Electrochemical phase formation and growth.
An introduction to the initial stages of metal deposition. VCH, Weinheim–New York–Basel–
Cambridge–Tokyo
102. Dryfe RAW, Uehara A, Booth SG (2014) Chem Rec 14:1013–1023
103. Scholz F, Hasse U (2005) Electrochem Commun 7:541–546
104. Koyama A, Fukami K, Yamauchi T, Nishi N, Sakka T, Kitada A, Murase K (2014) ECS
Electrochem Lett 3:G5–G7
105. El-Giar EM, Said RA, Bridges GE, Thomson DJ (2000) J Electrochem Soc 147:586–591
106. Jansson A, Thornell G, Johansson S (2000) J Electrochem Soc 147:1810–1817
107. Seol SK, Yi JM, Jin X, Kim CC, Je JH, Tsai WL, Hsu PC, Hwu Y, Chen CH, Chang LW,
Margaritondo G (2004) Electrochem Solid State Lett 7:C95–C97
108. Said RA (2004) J Microeletromech Sys 13:822–832
109. Choo JH, Yeo SH, Tan FF (2004) Microsys Technol 10:127–136
110. Lin CS, Lee CY, Yang JH, Huang YS (2005) Electrochem Solid State Lett 8:125–129
111. Chang TK, Lin JC, Yang JH, Yeh PC, Lee DL, Jiang SB (2007) J Micromech Microeng
17:2336–2343
112. Yang JH, Lin JC, Chang TK, Lai GY Jiang BS (2008) J Micromech Microeng 18:055023(1–8)
113. Lin JC, Chang TK, Yang JH, Jeng JH, Lee DL, Jiang SB (2009) J Micromech Microeng
19:015030(1–10)
114. Lin JC, Chang TK, Yang JH, Chen YS, Chuang CL (2010) Electrochim Acta 55:1888–1894
115. Penner RM (1993) Scanning Microsc 3:805–813
116. Simeone FC, Albonetti C, Cavallini M (2009) J Phys Chem C 113:18987–18994
117. Tao NJ, Li CZ, He HX (2000) J Electroanal Chem 492:81–93
118. Kolb DM, Simeone FC (2005) Electrochim Acta 50:2989–2996
119. Li W, Virtanen JA, Penner RM (1992) Appl Phys Lett 60:1181–1183
120. Li W, Virtanen JA, Penner RM (1992) J Phys Chem 96:6529–6532
121. Heidelberg A, Rozenkranz C, Schultze JW, Schäpers T, Staikov G (2005) Surf Sci 597:173–
180
122. Ullmann R, Will T, Kolb DM (1993) Chem Phys Lett 209:238–242
123. Schindler W, Hofmann D, Kirschner J (2000) J Appl Phys 87:7007–7009
124. Schindler W, Hofmann D, Kirschner J (2001) J Electrochem Soc 148:C124–C130
125. Schindler W, Hugelmann P, Hugelmann M, Kärtner FX (2002) J Electroanaly Chem 522:49–
57
126. Widmer R, Siegenthaler H (2005) Electrochem Commun 7:421–426
127. Li W, Hsiao GS, Harris D, Nyffenegger RM, Virtanen JA, Penner RM (1996) J Phys Chem
100:20103–20113
128. Kolb DM, Ullmann R, Will T (1997) Science 275:1097–1099
129. Maupai S, Stratmann M, Dakkouri AS (2002) Electrochem Solid State Lett 5:C35–C37
130. Engelmann GE, Ziegler JC, Kolb DM (1998) Surf Sci 401:L420–L424
131. Maupai S, Dakkouri AS, Stratmann M, Schmuki P (2003) J Electrochem Soc 150:C111–C114
132. Zhang Y, Maupai S, Schmuki P (2004) Surf Sci 551:L33–L39
133. Maupai S, Dakkouri AS, Schmuki P (2005) Surf Sci 597:20–25
134. Kolb DM, Engelmann GE, Ziegler JC (2000) Solid State Ionics 131:69–78
135. Kolb DM, Ullmann R, Ziegler JC (1998) Electrochim Acta 43:2751–2760
136. Wei YM, Zhou XS, Wang JG, Tang J, Mao BW, Kolb DM (2008) Small 4:1355–1358
137. Schuster R, Kirchner V, Xia XH, Bittner AM,† Ertl G (1998) Phys Rev Lett 80:5599–5602