3.4 Deposition
65
Cu
Ti film
Segregated Cu
i)
(a)
(b)
ii)
Ti film
Nb film
Segregated Cu
Cu subst.
Segregated Ti
0
1
2
3
4
5
6
-0.25
-0.20
-0.15
-0.10
-0.05
0.00
Decrease in work function (eV)
Cu concentration (at.%)
0
5
10
15
20
25
30
-0.30
-0.25
-0.20
-0.15
-0.10
-0.05
0.00
Decrease in work function (eV)
Ti concentration (at.%)
Fig. 3.31 a Change in work function upon nonequilibrium surface segregation of substrate atoms
for Ti film/Cu substrate (see text for explanation). b Change in work function upon nonequilibrium
surface segregation for Nb film/Ti film/Cu substrate: (i) as a function of segregated Cu concentration;
(ii) as a function of segregated Ti concentration