3. Tin 2-ethylhexanoate 92.5–100.0% (SnOct2).
4. Trimethylolpropane !98.0% (TMP).
5. Trimethylamine !99% (NEt3).
6. Methacrylic anhydride 94% (contains 2000 ppm Topanol A as
inhibitor).
7. Methanol absolute.
Fig. 1 Visualization of five TPMS scaffolds with their respective harmonic trigonometric functions. (a) CAD
designs representing the repeated unit cells, (b) assemblies of 4 Â 4 Â 4 unit cells to create a sophisticated
3D porous structure, (c) SEM images of the built structures prepared from the PTMC resin by SL. Offset values
C are chosen for each structure to reach 65% of porosity
Fig. 2 Synthesis of PTMC photosensitive resin by successive ROP and end-functionalization
TPMS Scaffolds by Stereolithography
21
4. Trimethylolpropane !98.0% (TMP).
5. Trimethylamine !99% (NEt3).
6. Methacrylic anhydride 94% (contains 2000 ppm Topanol A as
inhibitor).
7. Methanol absolute.
Fig. 1 Visualization of five TPMS scaffolds with their respective harmonic trigonometric functions. (a) CAD
designs representing the repeated unit cells, (b) assemblies of 4 Â 4 Â 4 unit cells to create a sophisticated
3D porous structure, (c) SEM images of the built structures prepared from the PTMC resin by SL. Offset values
C are chosen for each structure to reach 65% of porosity
Fig. 2 Synthesis of PTMC photosensitive resin by successive ROP and end-functionalization
TPMS Scaffolds by Stereolithography
21