160
8 Nanofabrication on Reactive Block Copolymer Film …
Fig. 8.9 Schematic of DPN process and AFM friction force image of square-shaped feature of G5
PAMAM dendrimers deposited by DPN on top of a NHS-functionalized PS-b-PtbA film
150 nm could be deposited by DPN (Fig. 8.10). Diffusion experiments, according
to the method described by various authors did not show circular features, which
implies that the diffusion of G5 PAMAM dendrimers on these reactive platform (or
rather dendrimer molecules over each other) is very slow and hence that it should
be possible, in the future, to deposit few or even isolated dendrimer molecules to
reactive islands obtained by the solvent treatment procedure discussed above.
In summary, nanopatterns obtained by a selective solvent treatment-induced
film restructuring of PS 690 -b-PtBA 1210 films can be deprotected by hydrolysis and
Fig. 8.10 AFM friction
force image of
DPN-patterned G5 PAMAM
dendrimers on top of
NHS-functionalized
PS-b-PtbA film
8 Nanofabrication on Reactive Block Copolymer Film …
Fig. 8.9 Schematic of DPN process and AFM friction force image of square-shaped feature of G5
PAMAM dendrimers deposited by DPN on top of a NHS-functionalized PS-b-PtbA film
150 nm could be deposited by DPN (Fig. 8.10). Diffusion experiments, according
to the method described by various authors did not show circular features, which
implies that the diffusion of G5 PAMAM dendrimers on these reactive platform (or
rather dendrimer molecules over each other) is very slow and hence that it should
be possible, in the future, to deposit few or even isolated dendrimer molecules to
reactive islands obtained by the solvent treatment procedure discussed above.
In summary, nanopatterns obtained by a selective solvent treatment-induced
film restructuring of PS 690 -b-PtBA 1210 films can be deprotected by hydrolysis and
Fig. 8.10 AFM friction
force image of
DPN-patterned G5 PAMAM
dendrimers on top of
NHS-functionalized
PS-b-PtbA film