INDEX
385
Re (rhenium) nanoparticle magnetic
reactivity
moment, 89
nanoparticle, 83
nanoparticle, measurement of, 83, 84
read mode, 182, 346
reciprocal space, 22, 234
reflection high energy electron diffraction
rehybridize, 124
remnant magnetization, 169, 170
particle size dependence, 172
replication, 3 19
repulsion
sketch, 23
(MEED), 45
hard-sphere, 158
soft, 158
residue, 314
resist, 228, 263
resistor network, 232
responsivity, 250, 251
RF plasma nanoparticle synthesis, 97, 98
Rh (rhodium), 265, 266, 279
ribonucleic acid, see RNA
ribosome, 315, 324
rigid beam vibration, 7
RNA (ribonucleic acid), 257, 3 14, 320, 323
messenger, 323
rotaxane, 351-353
Ru (ruthenium), 279
bonded to nanotube, 129
catalyst, 129
rubber, 284
Rydberg
level x-ray emission, 66
series, 196, 244
series, exciton, 32
series, figure, 33
saponite, 274, 276
saturation magnetization, 170
Sb (antimony), size, 42
SC, simple cubic, 36
scanning electron microscope, 150, 292
image, 177, 178
scanning microscopy, 5 1
scanning transmission electron microscope,
particle size dependence, 174
52, 53
schematic, 53
scanning tunneling microscope (STM), 2 4 ,
52,54, 118, 119, 336338,341
constant height and constant current
modes, 55
scattering
conduction electrons, 4
intraband, 232
length, 4
light, 286
scattering length, 73
Schrodinger equation, 77
scooter mechanism, 1 17
screening, Debye, 159
Se (selenium)
crystal, 154
optical spectrum, 156
secondary structure, 3 15, 3 18
Seebeck effect, 244
self assembled monolayer (SAM), 80, 260
self assembly, 4, 257, 261-263, 294-297,
300, 330
octanethiol, 349
polyamine dendnmer, 300
supramolecular, 302
semiconductor, 20
indirect gap, 25, 27, 30
intrinsic, 21
n-type, 21, 152
p-ty~e, 21, 152
semiconductor property tabulations
sensor, chemical, 128
serine, 325
shielding, electromagnetic, 293
short range order, 9
shot noise, 246
Si (silicon), 15, 25, 260
bandgap, 31
carrier density, 26, 29
computer chip, 345
donor, 30
etched, 150
n-type, 152
nanoparticle, 90
nanoparticle photodissociation, 92
porous, 15 1
Raman spectrum, 205-207
wafer, 151
wafer, etched, 152
Si, nuclear magnetic resonance, 269, 270
FTIR, 60
nanopowder FTIR, 59
(Appendix B), 361
P-type, 152
29
SiCN
silane, 300
silanol, 269, 270
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