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5, 957–961 (2005)
268. J. Dong, J. Liu, G. Kang, J. Xie, Y. Wang, Pushing the resolution of photolithography down
to 15 nm by surface plasmon interference. Sci. Rep. 4, 5618 (2014)
269. S.W. Hell, J. Wichmann, Breaking the diffraction resolution limit by stimulated emission:
stimulated-emission-depletion fluorescence microscopy. Opt. Lett. 19, 780–782 (1994)
270. E. Rittweger, K.Y. Han, S.E. Irvine, C. Eggeling, S.W. Hell, STED microscopy reveals crystal
colour centres with nanometric resolution. Nature Photon. 3, 144–147 (2009)
271. B. Harke, P. Bianchini, F. Brandi, A. Diaspro, Photopolymerization inhibition dynamics for
sub-diffraction direct laser writing lithography. Chem. Phys. Chem. 13, 1429–1434 (2012)
272. B. Harke, J. Keller, C.K. Ullal, V. Westphal, A. Schönle, S.W. Hell, Resolution scaling in
STED microscopy. Opt. Express 16, 4154–4162 (2008)
273. R. Wollhofen, J. Katzmann, C. Hrelescu, J. Jacak, T.A. Klar, 120 nm resolution and 55 nm
structure size in STED-lithography. Opt. Express 21, 10831–10840 (2013)
274. A.G. Vitukhnovsky, D.A. Chubich, S.P. Eliseev, V.V. Sychev, D.A. Kolymagin, A.S. Selyukov,
Advantages of STED-inspired 3D direct laser writing for fabrication of hybrid nanostructures.
J. Russian Laser Res. 38, 375–382 (2017)
275. M. Wiesbauer, R. Wollhofen, B. Vasic, K. Schilcher, J. Jacak, T.A. Klar, Nano-anchors with
single protein capacity produced with STED lithography. Nano Lett. 13, 5672–5678 (2013)
276. X. He, T. Li, J. Zhang, Z. Wang, STED direct laser writing of 45 nm width nanowire.
Micromachines 10, 726 (2019)
277. Z. Gan, Y. Cao, R.A. Evans, M. Gu, Three-dimensional deep sub-diffraction optical beam
lithography with 9 nm feature size. Nat. Commun. 4, 2061 (2013)
A. Hu et al.
255. Y. Ye, L. Chen, X. Liu, U.J. Krull, DNA and microfluidics: building molecular electronics
systems. Anal. Chim. Acta 568, 138–145 (2006)
256. L. Li, M. Hong, M. Schmidt, M. Zhong, A. Malshe, B. Huis in’t Veld, V. Kovalenko, Laser
nano-manufacturing—State of the art and challenges. CIRP Ann. 60 735–755 (2011)
257. C. Barner-Kowollik, M. Bastmeyer, E. Blasco, G. Delaittre, P. Müller, B. Richter, M. Wegener,
3D laser micro- and nanoprinting: challenges for chemistry. Angewandte Chemie Int. Edn.
56, 15828–15845 (2017)
258. T. Gissibl, S. Thiele, A. Herkommer, H. Giessen, Two-photon direct laser writing of
ultracompact multi-lens objectives. Nat. Photon. 10, 554–560 (2016)
259. C. Liao, W. Anderson, F. Antaw, M. Trau, Two-photon nanolithography of tailored hollow
three-dimensional microdevices for biosystems. ACS Omega 4, 1401–1409 (2019)
260. K.S. Worthington, A.-V. Do, R. Smith, B.A. Tucker, A.K. Salem, Two-photon polymerization
as a tool for studying 3D printed topography-induced stem cell fate. Macromol. Biosci. 19,
1800370 (2019)
261. Z.B. Wang, N. Joseph, L. Li, B.S. Luk’Yanchuk, A review of optical near-fields in particle/tipassisted laser nanofabrication. Proc. Inst. Mech. Eng. Part C: J. Mech. Eng. Sci. 224, 1113–
1127 (2010)
262. W. Guo, Z.B. Wang, L. Li, D.J. Whitehead, B.S. Luk’yanchuk, Z. Liu, Near-field laser parallel
nanofabrication of arbitrary-shaped patterns. Appl. Phys. Lett. 90, 243101 (2007)
263. S.M. Huang, M.H. Hong, B.S. Luk’yanchuk, Y.W. Zheng, W.D. Song, Y.F. Lu, T.C. Chong,
Pulsed laser-assisted surface structuring with optical near-field enhanced effects. J. Appl.
Phys. 92, 2495–2500 (2002)
264. J.W. Kingsley, S.K. Ray, A.M. Adawi, G.J. Leggett, D.G. Lidzey, Optical nanolithography
using a scanning near-field probe with an integrated light source. Appl. Phys. Lett. 93, 213103
(2008)
265. W. Srituravanich, N. Fang, C. Sun, Q. Luo, X. Zhang, Plasmonic nanolithography. Nano Lett.
4, 1085–1088 (2004)
266. W. Srituravanich, S. Durant, H. Lee, C. Sun, X. Zhang, Deep subwavelength nanolithography
using localized surface plasmon modes on planar silver mask. J. Vacuum Sci. Technol. B:
Microelectron. Nanometer Struct. Process. Measure. Phenomena 23, 2636–2639 (2005)
267. Z.-W. Liu, Q.-H. Wei, X. Zhang, Surface plasmon interference nanolithography. Nano Lett.
5, 957–961 (2005)
268. J. Dong, J. Liu, G. Kang, J. Xie, Y. Wang, Pushing the resolution of photolithography down
to 15 nm by surface plasmon interference. Sci. Rep. 4, 5618 (2014)
269. S.W. Hell, J. Wichmann, Breaking the diffraction resolution limit by stimulated emission:
stimulated-emission-depletion fluorescence microscopy. Opt. Lett. 19, 780–782 (1994)
270. E. Rittweger, K.Y. Han, S.E. Irvine, C. Eggeling, S.W. Hell, STED microscopy reveals crystal
colour centres with nanometric resolution. Nature Photon. 3, 144–147 (2009)
271. B. Harke, P. Bianchini, F. Brandi, A. Diaspro, Photopolymerization inhibition dynamics for
sub-diffraction direct laser writing lithography. Chem. Phys. Chem. 13, 1429–1434 (2012)
272. B. Harke, J. Keller, C.K. Ullal, V. Westphal, A. Schönle, S.W. Hell, Resolution scaling in
STED microscopy. Opt. Express 16, 4154–4162 (2008)
273. R. Wollhofen, J. Katzmann, C. Hrelescu, J. Jacak, T.A. Klar, 120 nm resolution and 55 nm
structure size in STED-lithography. Opt. Express 21, 10831–10840 (2013)
274. A.G. Vitukhnovsky, D.A. Chubich, S.P. Eliseev, V.V. Sychev, D.A. Kolymagin, A.S. Selyukov,
Advantages of STED-inspired 3D direct laser writing for fabrication of hybrid nanostructures.
J. Russian Laser Res. 38, 375–382 (2017)
275. M. Wiesbauer, R. Wollhofen, B. Vasic, K. Schilcher, J. Jacak, T.A. Klar, Nano-anchors with
single protein capacity produced with STED lithography. Nano Lett. 13, 5672–5678 (2013)
276. X. He, T. Li, J. Zhang, Z. Wang, STED direct laser writing of 45 nm width nanowire.
Micromachines 10, 726 (2019)
277. Z. Gan, Y. Cao, R.A. Evans, M. Gu, Three-dimensional deep sub-diffraction optical beam
lithography with 9 nm feature size. Nat. Commun. 4, 2061 (2013)