1000
0.01
100
10
1
0.10
0.05
σ U =1.02
=1.01
P 0L
Y 00
0.10
1.8
0.50
Offset frequency
(a)
(b)
(c)
K 2
*PN (F)
1
5 1 0
1000
0.01
100
10
1
0.10
0.05
σ U =1.02
=1.01
P 0L
Y 00
0.10
1.3
0.50
Offset frequency
K 2
*PN (F)
1
5 1 0
10 8
10 5
100
0.1
10 –4
0.05
σ U =0.05
=1.001
P 0L
Y 00
0.10
1.8
0.50
Offset frequency
K 2
*PN (F)
1
5 1 0
Fig. 6.19 Dependences of
suppression coefficients of
the phase noise K
2
ΓFM F
ð Þ in
OEO MZ at P 0L /Y 00 ¼ 1.01
and 1.8 for σ U ¼ 1.02 (a); at
P 0L /Y 00 ¼ 1.01 and 1.3 for
σ U ¼ 1.02 (b); at P 0L /
Y 00 ¼ 1.001 and 1.8 for
σ U ¼ 0.05 (c)
326
6 Operation Analysis of Optoelectronic oscillator (OEO) with External. . .
0.01
100
10
1
0.10
0.05
σ U =1.02
=1.01
P 0L
Y 00
0.10
1.8
0.50
Offset frequency
(a)
(b)
(c)
K 2
*PN (F)
1
5 1 0
1000
0.01
100
10
1
0.10
0.05
σ U =1.02
=1.01
P 0L
Y 00
0.10
1.3
0.50
Offset frequency
K 2
*PN (F)
1
5 1 0
10 8
10 5
100
0.1
10 –4
0.05
σ U =0.05
=1.001
P 0L
Y 00
0.10
1.8
0.50
Offset frequency
K 2
*PN (F)
1
5 1 0
Fig. 6.19 Dependences of
suppression coefficients of
the phase noise K
2
ΓFM F
ð Þ in
OEO MZ at P 0L /Y 00 ¼ 1.01
and 1.8 for σ U ¼ 1.02 (a); at
P 0L /Y 00 ¼ 1.01 and 1.3 for
σ U ¼ 1.02 (b); at P 0L /
Y 00 ¼ 1.001 and 1.8 for
σ U ¼ 0.05 (c)
326
6 Operation Analysis of Optoelectronic oscillator (OEO) with External. . .
