3 Scintillation Detectors for Charged Particles and Photons
89
26. A. Annekov, M. Korzhik, P. Lecoq, et al., Slow components and afterglow in PWO crystal
scintillation, Nucl. Instrum. Meth. A 403 (1998) 302-312.
27. US Patent 5521387
28. Chen Lingyan, Du Jie, Wang Liming, Xiang Kaihua, An investigation of radiation damage
induced by hydroxyl and oxygen impurities in BaF2 crystal, Scintillator and Phospor Materials
MRS Proceeding 348 (1994) 447-454.
29. A. Annenkov, M. Korzhik, P. Lecoq, Lead tungstate scintillation material, Nucl. Instrum.
Meth. A 490 (2002) 30–50.
30. M. Nikl et al., Defect Engineering in Ce-Doped Aluminum Garnet Single Crystal Scintillators,
Cryst. Growth Des. 2014, 14, 4827−4833, dx.doi.org/10.1021/cg501005s
31. Z.W. Yin, Q. Deng, D.S. Yan, Research and Development Works on PbWO4 Crystals
in Shanghai Institute of Ceramics, Proc. 5 th Int. Conf. Inorganic Scintillators and their
Applications, Moscow, Apr 16-20, 1999, pp. 206-211.
32. S. Kyropolos, F. Zeits, Ein Verfahren zur Herstellung grosser Kristalle. Anorg. Allgem. Chem.
154 (1926) 308–313.
33. J. Czochralski, Ein neues Verfahren zur Messung der Kristallisationsgeschwindigkeit der
Metalle, Z. Phys. Chem. 92 (1918) 219-224.
34. B. Hautefeuille et al., J. Crystal Growth 289 (2006) 172.
Open Access This chapter is licensed under the terms of the Creative Commons Attribution 4.0
International License (http://creativecommons.org/licenses/by/4.0/), which permits use, sharing,
adaptation, distribution and reproduction in any medium or format, as long as you give appropriate
credit to the original author(s) and the source, provide a link to the Creative Commons licence and
indicate if changes were made.
The images or other third party material in this chapter are included in the chapter’s Creative
Commons licence, unless indicated otherwise in a credit line to the material. If material is not
included in the chapter’s Creative Commons licence and your intended use is not permitted by
statutory regulation or exceeds the permitted use, you will need to obtain permission directly from
the copyright holder.
89
26. A. Annekov, M. Korzhik, P. Lecoq, et al., Slow components and afterglow in PWO crystal
scintillation, Nucl. Instrum. Meth. A 403 (1998) 302-312.
27. US Patent 5521387
28. Chen Lingyan, Du Jie, Wang Liming, Xiang Kaihua, An investigation of radiation damage
induced by hydroxyl and oxygen impurities in BaF2 crystal, Scintillator and Phospor Materials
MRS Proceeding 348 (1994) 447-454.
29. A. Annenkov, M. Korzhik, P. Lecoq, Lead tungstate scintillation material, Nucl. Instrum.
Meth. A 490 (2002) 30–50.
30. M. Nikl et al., Defect Engineering in Ce-Doped Aluminum Garnet Single Crystal Scintillators,
Cryst. Growth Des. 2014, 14, 4827−4833, dx.doi.org/10.1021/cg501005s
31. Z.W. Yin, Q. Deng, D.S. Yan, Research and Development Works on PbWO4 Crystals
in Shanghai Institute of Ceramics, Proc. 5 th Int. Conf. Inorganic Scintillators and their
Applications, Moscow, Apr 16-20, 1999, pp. 206-211.
32. S. Kyropolos, F. Zeits, Ein Verfahren zur Herstellung grosser Kristalle. Anorg. Allgem. Chem.
154 (1926) 308–313.
33. J. Czochralski, Ein neues Verfahren zur Messung der Kristallisationsgeschwindigkeit der
Metalle, Z. Phys. Chem. 92 (1918) 219-224.
34. B. Hautefeuille et al., J. Crystal Growth 289 (2006) 172.
Open Access This chapter is licensed under the terms of the Creative Commons Attribution 4.0
International License (http://creativecommons.org/licenses/by/4.0/), which permits use, sharing,
adaptation, distribution and reproduction in any medium or format, as long as you give appropriate
credit to the original author(s) and the source, provide a link to the Creative Commons licence and
indicate if changes were made.
The images or other third party material in this chapter are included in the chapter’s Creative
Commons licence, unless indicated otherwise in a credit line to the material. If material is not
included in the chapter’s Creative Commons licence and your intended use is not permitted by
statutory regulation or exceeds the permitted use, you will need to obtain permission directly from
the copyright holder.