Semiconductor
manufacturing
General
operation
Reduction of pressure to
vaporize water at cooler temperature and concentrate and
precipitate solutes
Installation of systems to facilitate chrome waste generation
Substation requires photoresist
for TCA and methylene chloride during board manufacturing
Substitution of CFC 113 and
TCA with non-clean
fluxes,
aqueous clean
fluxes, semiaqueous cleaning agents and
other solvents
Printed wiring
boards
General
operation
Modification of sludge
pretreatment processes.
Redesigning of PWB during
board assembly
Reduction of pressure to
vaporize water at cooler temperature and concentrate and
precipitate solutes
Segregation of
wastewater sludge
for subsequent metal
recovery
Source: [20]
4 Electrical and Electronic Wastes Treatment
185
manufacturing
General
operation
Reduction of pressure to
vaporize water at cooler temperature and concentrate and
precipitate solutes
Installation of systems to facilitate chrome waste generation
Substation requires photoresist
for TCA and methylene chloride during board manufacturing
Substitution of CFC 113 and
TCA with non-clean
fluxes,
aqueous clean
fluxes, semiaqueous cleaning agents and
other solvents
Printed wiring
boards
General
operation
Modification of sludge
pretreatment processes.
Redesigning of PWB during
board assembly
Reduction of pressure to
vaporize water at cooler temperature and concentrate and
precipitate solutes
Segregation of
wastewater sludge
for subsequent metal
recovery
Source: [20]
4 Electrical and Electronic Wastes Treatment
185
