Table 4.40
Transfers for semiconductor manufacturing facilities (SIC 3674) in TRI, by number of facilities (transfers reported in pounds/year)
Chemical name
# Reporting
chemical
POTW
discharges
Disposal
Recycling Treatment
Energy
recovery
Total
transfers
Average transfer per
facility
Sulfuric acid
125
147449
500380
1039071
169372
0
1856272
14850
Hydrochloric acid
78
236415
29599
21664
84745
5
372428
4775
Hydrogen Fluoride
71
11733
198630
525
151929
0
362817
5110
Phosphoric acid
69
1103
269124
200000
33594
0
503821
7302
Nitric acid
57
56177
99817
20910
62904
0
239808
4207
Acetone
53
104090
1582
136987
116610
1075656
1442137
27210
Ammonia
42
944298
52771
650
10806
0
1008525
24013
Glycol ethers
27
30889
3345
139100
56330
1049440
1279104
47374
Xylene (mixed isomers)
25
3891
824
31304
127501
728688
892208
35688
Ethylene glycol
16
458412
2027
15194
623
102016
578272
36142
Methanol
16
14474
0
27715
64502
716413
823104
51444
Freon 113
10
25
592
36937
2435
5660
45649
4565
1,1,1-Trichloroethane
8
263
5
75267
18264
8000
101799
12725
Methyl ethyl ketone
6
869
750
0
2105
276109
279833
46639
Tetrachloroethylene
4
0
0
10215
59628
53000
122843
30711
Ammonium Nitrate
(solution)
3
224302
0
0
0
0
224302
74767
Ammonium Sulfate
(solution)
3
1488462
0
122000
0
0
1610462
536821
Lead
3
0
1500
59125
13961
0
74586
24862
Phenol
3
2331
0
0
27
94679
97037
32346
Toluene
3
0
0
0
17000
5970
22970
7657
Trichloroethylene
3
0
0
59736
0
0
59736
19912
Copper
2
0
18
0
166
0
184
92
Ethylbenzene
2
0
146
0
190
16800
17136
8568
174
O. S. Amuda et al.